OBERKOCHEN, Germany — Carl Zeiss SMT AG has delivered Starlith 1400 lenses with a numeric aperture of 0.93 and capable of 55-nanometer resolution to lithography machine vendor ASML Holding NV, Zeiss ...
BELMONT, Calif. — Nikon Precision Inc. has introduced to the market a scan-field i-line stepper, NSR-SF130. The machine has a lens system that provides a 26-mm by 33-mm exposure field, similar to deep ...
Zelenograd Nanotechnology Center (ZNTC) and Planar have concluded developing Russia's first lithography system capable of supporting 350nm-class process technologies (0.35 micron). The development was ...
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