Use left and right arrow keys to seek audio. ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV ...

ASML's 2025 annual report stated that its lithography tool output is limited by Carl Zeiss SMT's capacity.

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...

Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...

Highly anticipated: ASML specializes in manufacturing photolithography machines used to etch computer chips out of silicon wafers. The Dutch corporation is, indeed, the most highly valued European ...

Zeiss Semiconductor Manufacturing Technology has confirmed that it's adding around 25,000 square meters of production and production-adjacent space at Oberkochen in southern Germany.

At the recent SPIE Photomask Technology + EUV Lithography conference, Japan’s High Energy Accelerator Research Organization (KEK) presented a paper on its latest efforts to develop a free-electron ...

Belgian R&D company Imec has reported a number of chip making breakthroughs at the joint lab it runs with EUV lithography company ASML. According to Imec, it has successfully printed circuit patterns ...

Belgium-based semiconductor research institute Imec will present its latest achievements that enable high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography at the 2024 Advanced ...

The critical role of EUV pellicles: These thin membranes protect photomasks from contaminants, reducing defect rates and ensuring flawless chip production. The limitations of traditional materials: ...

SAN JOSE, Calif. — The numbers for the development of future EUV mask and metrology tools are too costly and do not add up, according to experts at the SPIE Advanced Lithography event here. As ...

AUSTIN, Texas — Developers of extreme-ultraviolet (EUV) lithography are looking north, specifically to the University at Albany, State University of New York, for their future. Next week, the first of ...