SAN JOSE, Calif. — Actinix Inc. has been awarded a Phase II grant from the National Science Foundation (NSF) to complete the development of its phase-shift metrology system for advanced photomasks ...
Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...
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